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Project

Semiconductor devices Performance evaluation of semiconductor components and equipment - Part 1: Transmittance evaluation method of EUV pellicle

Abstract

This part of IEC 63567-1 ED1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance. The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.

Begin

2024-07-12

Planned document number

DIN EN IEC 63567-1

Project number

02232442

Responsible national committee

DKE/K 631 - Halbleiterbauelemente  

Contact

Elena Rongen

Merianstr. 28
63069 Offenbach am Main

Tel.: +49 69 6308-429

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