Project
Semiconductor devices Performance evaluation of semiconductor components and equipment - Part 1: Transmittance evaluation method of EUV pellicle
Abstract
This part of IEC 63567-1 ED1 proposes a method of measuring the transmittance of extreme ultraviolet (EUV) pellicle used for extreme ultraviolet lithography (EUVL) and provides guidelines on the conditions of the transmittance measurement instrument using EUV with a short wavelength and methods for calculating EUV transmittance. The scope of this document applies to all types of membranes attached to the front side of a reflective mask (or reflective reticle) used in EUVL to physically protect the reflective mask from contaminant particles generated inside the chamber during EUV exposure.
Begin
2024-07-12
Planned document number
DIN EN IEC 63567-1
Project number
02232442
