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ISO/CD 19383
Atomic Layer Deposition-- Chemical characteristics and related process specifications of atomic layer deposition precursors
ISO/CD 25164
Physical vapor deposition coatings - Magnetron sputtering deposition of TiAlSiN thin films - Specification
ISO/TC 107/WG 5
Atomic layer deposition
NA 134-02-01-08 UA
Environmental meteorology - Deposition parameters
NA 134-02-01-58 UA
Deposition of substances FFH
ISO/TC 107/SC 9
Physical vapor deposition coatings
NA 134-04-02-10 UA
Measurement of atmospheric depositions and elements in ambient air
prEN ISO 52922
Additive manufacturing - Design - Directed energy deposition of metals
DIN EN ISO 52922
Additive manufacturing - Design - Directed energy deposition of metals
ISO/ASTM CD 52922
Additive manufacturing - Design - Directed energy deposition of metals
