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Standards [CURRENT]

ISO 17109

Surface chemical analysis - Depth profiling - Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter depth profiling using single and multi-layer thin films
Edition 2022-03

Standards [CURRENT]

BS ISO 5861

Surface chemical analysis. X-ray photoelectron spectroscopy. Method of intensity calibration for quartz-crystal monochromated Al Ka XPS instruments
Edition 2024-06-13

Standards [CURRENT]

BS ISO 10810

Surface chemical analysis. X-ray photoelectron spectroscopy. Guidelines for analysis
Edition 2019-08-23

Standards [CURRENT]

BS ISO 13424

Surface chemical analysis. X-ray photoelectron spectroscopy. Reporting of results of thin-film analysis
Edition 2013-10-31

Standards [CURRENT]

BS ISO 14701

Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness
Edition 2018-11-05

Standards [CURRENT]

BS ISO 15470

Surface chemical analysis. X-ray photoelectron spectroscopy. Description of selected instrumental performance parameters
Edition 2017-03-31

Standards [CURRENT]

BS ISO 16129

Surface chemical analysis. X-ray photoelectron spectroscopy. Procedures for assessing the day-to-day performance of an X-ray photoelectron spectrometer
Edition 2018-11-19

Standards [CURRENT]

BS ISO 17109

Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films
Edition 2022-04-13

Standards [CURRENT]

BS ISO 18118

Surface chemical analysis. Auger electron spectroscopy and X-ray photoelectron spectroscopy. Guide to the use of experimentally determined relative sensitivity factors for the quantitative analysis of homogeneous materials
Edition 2024-03-04

Standards [CURRENT]

BS ISO 18554

Surface chemical analysis. Electron spectroscopies. Procedures for identifying, estimating and correcting for unintended degradation by X-rays in a material undergoing analysis by X-ray photoelectron spectroscopy
Edition 2016-03-31

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