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DIN 50452-2
Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 2: Determination of particles by optical particle counters
Edition
2009-10
DIN 50452-3
Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 3: Calibration of optical particle counters
Edition
1995-10
DIN 50453-1
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 1: Silicium monocrystals, gravimetric method
Edition
2023-08
DIN 50453-2
Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method
Edition
2023-08
DIN 50455-1
Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods
Edition
2009-10
DIN 50455-2
Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
Edition
1999-11
DIN 50940-1
Determination of the inhibiting effect of pickling inhibitors - Part 1: Inhibition of the removal of ferrous materials
Edition
2019-04
DIN 50989-2
Ellipsometry - Part 2: Bulk material model; Text in German and English
Edition
2021-04
DIN 50989-6
Ellipsometry - Part 6: Effective Materials model; Text in German and English
Edition
2024-02
DIN 51456
Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
Edition
2013-10