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Standards [CURRENT]

DIN 50452-3

Testing of materials for semiconductor technology - Test method for particle analysis in liquids - Part 3: Calibration of optical particle counters
Edition 1995-10

Standards [CURRENT]

DIN 50453-1

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 1: Silicium monocrystals, gravimetric method
Edition 2023-08

Standards [CURRENT]

DIN 50453-2

Testing of materials for semiconductor technology - Determination of etch rates of etching mixtures - Part 2: Silicon-dioxide coating, optical method
Edition 2023-08

Standards [CURRENT]

DIN 50455-1

Testing of materials for semiconductor technology - Methods for characterizing photoresists - Part 1: Determination of coating thickness with optical methods
Edition 2009-10

Standards [CURRENT]

DIN 50455-2

Testing of materials for semiconductor technology - Methods for the characterisation photoresists - Part 2: Determination of photosensitivity of positive photoresists
Edition 1999-11

Standards [CURRENT]

DIN 50940-1

Determination of the inhibiting effect of pickling inhibitors - Part 1: Inhibition of the removal of ferrous materials
Edition 2019-04

Standards [CURRENT]

DIN 50989-2

Ellipsometry - Part 2: Bulk material model; Text in German and English
Edition 2021-04

Standards [CURRENT]

DIN 50989-6

Ellipsometry - Part 6: Effective Materials model; Text in German and English
Edition 2024-02

Standards [CURRENT]

DIN 51456

Testing of materials for semiconductor technology - Surface analysis of silicon wafers by multielement determination in aqueous analysis solutions using mass spectrometry with inductively coupled plasma (ICP-MS)
Edition 2013-10

Standards [CURRENT]

DIN 51901

Testing of carbonaceous materials - Determination of density by the xylene method - Solid materials
Edition 2006-11

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